Microfabrication station

This spin coater is both compact and equipped with advanced features such as a centering tool and a removable PTFE liner for easy cleaning. It accommodates wafers up to 6 inches in diameter (150mm) and square substrates measuring 5 inches x 5 inches (127mm x 127mm).The device is finely calibrated to allow for controlled and repeatable applications of photoresists or PDMS layers. Additionally, the lid features a hole to facilitate dynamic coating.

Its compact size, coupled with the attached control panel, enhances its portability. Furthermore, a built-in safety device prevents solvents from entering the engine, ensuring its longevity.

This rolling mill is perfectly adapted for dry-film photoresist lamination. It is easy and fast to use, accommodating a variety of wafer sizes.With its homogeneous pressure between the rolls and adjustable parameters, including temperature and rolling speed, this mill serves as a clever tool for optimizing the photolithography process.

This UV Lamp is a robust and compact tabletop system, accommodating samples up to 4 inches in diameter, with a 6-inch option also available. It features automated chuck movement, offering variable mask-to-substrate distance control and enabling both hard (physical) and soft (proximity) masking contacts. A specialized optic provides highly collimated light, suitable for low-resolution (2µm) printing and thick layer printing (several hundred micrometers). These features make this device particularly well-suited for microfluidic applications. Its compact size allows for flexible installation in various locations, including outside of a clean room.

Ensure accurate, homogeneous, and stable temperature set points with this digital hotplate.

It allows for the establishment of a temperature ramp, facilitating the transition from one temperature to another before maintaining a stable temperature for a specified period.

Additionally, its thick aluminum top plate promotes slow cooling, which is ideal for various photoresist applications. Simplify your workflow by automating soft bakes and post-exposure bakes, thereby optimizing the photolithography process.

This compact desiccator allows for a simple and fast degassing process of your PDMS. Sized to accommodate a cup or Petri dish, it is perfectly suited for PDMS soft lithography processes.

This oven features natural convection drying and is equipped with a frontal panel that includes a bimetallic fluid expansion probe thermostat. Its minimal footprint allows for rapid pre-heating and reduced electricity consumption, making it an energy-efficient choice. The oven’s highly portable design enables it to be installed anywhere with ease.Designed specifically for 4-inch wafers, this oven efficiently cures PDMS. Its dimensions are ideally suited for a Petri dish size, allowing you to heat two molds simultaneously.

Elveflow’s Plasma Bonding Pen is a versatile and convenient two-in-one tool, perfect for optimized surface treatment. It is ideal for bonding PDMS to glass and PDMS to PDMS. Additionally, this pen provides advanced surface modification capabilities, akin to those found in traditional plasma chambers, but in a more portable and user-friendly format.